12 Inch Sapphire Wafer | 300 mm Al₂O₃ Substrate

12 Inch Sapphire Wafer is a 300 mm single-crystal Al₂O₃ substrate available with C-plane, A-plane, M-plane and customized crystal orientations. SSP, DSP and epi-ready surface configurations are available together with custom thickness, off-axis angle, notch, bevel and dimensional requirements.

Typical 300 mm C-plane sapphire wafers are available in 800 μm, 1000 μm and 1200 μm thickness options. Single wafer containers, wafer cassettes, FOSB packaging and customized packaging solutions are available according to order requirements.

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12 Inch Sapphire Wafer Specifications

The 12 Inch Sapphire Wafer is a 300 mm single-crystal
Al₂O₃ substrate available with standard and customized crystal orientations,
surface finishes and dimensional specifications.

Material-Semi supplies 300 mm sapphire wafers with C-plane, A-plane,
M-plane and customized orientations. Single-side polished (SSP),
double-side polished (DSP), epi-ready and customized surface configurations
are available according to different semiconductor, optical and research requirements.

Available 12 Inch Sapphire Wafer Options

Parameter Available Options
Material Single-Crystal Sapphire (Al₂O₃)
Diameter 300 mm / Custom dimensions available upon request
Crystal Orientation C-Plane (0001) / A-Plane / M-Plane / Custom Orientation
Off-Axis On-axis or customized off-axis angle and direction
Thickness 800 μm / 1000 μm / 1200 μm / Custom
Surface Finish SSP / DSP / Epi-ready / Custom
Front Surface Polished / CMP / Epi-ready
Back Surface Polished / Lapped / Fine Ground / Custom
Flat / Notch Customizable according to crystal orientation and application
Edge Profile T-Type / Custom bevel profile
Packaging Single Wafer Container / Wafer Cassette / FOSB / Custom Packaging

Typical 12 Inch C-Plane Sapphire Wafer Specification

The following table shows typical 300 mm C-plane sapphire wafer configurations.
Other thicknesses, orientations, surface finishes and off-axis specifications
can be customized according to customer requirements.

Parameter Production-1 Production-2 Production-3
Material >99.999% High-Purity Monocrystalline Al₂O₃ (KY)
Diameter 300 ±0.2 mm
Thickness 1000 ±50 μm 800 ±50 μm 1200 ±50 μm
Orientation C-Plane (0001)
Off-Set toward M-Axis 0.0° ±0.3°
Off-Set toward A-Axis 0.0° ±0.3°
Notch Orientation A-Plane, 0° ±1°
Notch Depth 1.0–1.25 mm
Notch Angle 85°–95°
Notch Chamfer None
Front Surface Epi-ready polished, Ra <0.3 nm
Back Surface Lapped or fine ground, 0.08 μm < Ra <1.2 μm
Bevel T-Type, 200 ±100 μm
TTV ≤25 μm
Bow ≤35 μm ≤40 μm ≤35 μm
Warp ≤120 μm ≤150 μm ≤120 μm
Chips ≤0.2 mm
Laser Mark None
Typical Packing CRC100 packed, 1 pc/box

12 Inch Sapphire Wafer Overview

The 12 Inch Sapphire Wafer is a 300 mm large-diameter
single-crystal Al₂O₃ substrate available for semiconductor, optical,
epitaxial and advanced substrate applications.

Material-Semi supplies both standard and customized 300 mm sapphire wafers.
Crystal orientation, wafer thickness, surface finish, off-axis angle,
notch configuration, edge profile and dimensional tolerances can be
customized according to project requirements.

800 μm, 1000 μm and 1200 μm Thickness Options

Typical 300 mm C-plane sapphire wafers are available with
800 ±50 μm, 1000 ±50 μm
and 1200 ±50 μm thickness specifications.

Other wafer thicknesses and customized dimensions can also be evaluated
according to customer requirements.

C-Plane, A-Plane and M-Plane Sapphire Wafers

Crystal orientation can be selected according to the intended application.
Available options include C-plane, A-plane, M-plane
and other customized crystal orientations.

Both on-axis and customized off-axis sapphire wafers are available.
Customers can specify the required off-axis angle and direction when
requesting a quotation.

SSP, DSP and Epi-Ready Sapphire Wafers

12 inch sapphire wafers can be supplied with
single-side polished (SSP),
double-side polished (DSP) or
epi-ready surface configurations.

The typical specification shown above uses an
epi-ready polished front surface with Ra <0.3 nm
and a lapped or fine-ground backside.
Other combinations, including double-side polishing, can be supplied
according to application requirements.

Custom Sapphire Wafer Options

In addition to standard 300 mm sapphire wafer specifications,
customized sapphire substrates are available for semiconductor,
optical and research applications.

  • Custom wafer diameter and dimensions
  • Custom wafer thickness
  • C-plane, A-plane, M-plane and other crystal orientations
  • On-axis and customized off-axis angle and direction
  • Single-side polished (SSP)
  • Double-side polished (DSP)
  • Epi-ready surface finishing
  • Custom frontside and backside surface finishing
  • Custom flat or notch orientation
  • Custom edge profile and bevel
  • Custom surface roughness and dimensional tolerances
  • Single wafer container, cassette, FOSB and custom packaging

For quotation and technical evaluation, please provide the required
diameter, orientation, thickness, surface finish, off-axis angle,
quantity and any other technical requirements.

Surface Quality and Wafer Geometry

The typical 300 mm sapphire specification provides a total thickness
variation of TTV ≤25 μm.
Typical Bow and Warp requirements vary with wafer thickness.

Frontside surface roughness, backside condition, chips, scratches,
bubbles and pits can be controlled according to the applicable
wafer specification.

How Sapphire Wafers Are Manufactured

Sapphire wafer manufacturing generally includes single-crystal growth,
crystal orientation, slicing, grinding, lapping, polishing,
cleaning and final inspection.

These processing stages are used to control wafer dimensions,
crystal orientation, surface roughness, wafer geometry and edge quality
before final inspection and packaging.

Packaging

The typical 300 mm specification uses
CRC100 packaging with one wafer per box.

Depending on wafer size, quantity and customer requirements,
sapphire wafers can also be supplied in
single wafer containers, wafer cassettes or FOSB packaging.
Customized packaging solutions are available for transportation,
storage and handling requirements.

Frequently Asked Questions

What is a 12 Inch Sapphire Wafer?

It is a large-diameter single-crystal Al₂O₃ substrate with a nominal
diameter of 300 mm.

What thicknesses are available?

Typical thickness options include 800 μm, 1000 μm and 1200 μm.
Other thicknesses can be customized according to customer requirements.

What crystal orientations are available?

C-plane, A-plane, M-plane and customized crystal orientations are available.
On-axis and customized off-axis specifications can also be supplied.

Are SSP and DSP sapphire wafers available?

Yes. Both single-side polished (SSP) and double-side polished (DSP)
sapphire wafers are available, together with epi-ready surface finishing.

What is the typical front surface roughness?

The typical epi-ready specification has a front surface roughness of
Ra <0.3 nm.

Can the wafer thickness and orientation be customized?

Yes. Wafer thickness, crystal orientation, off-axis angle,
surface finish, notch configuration, edge profile and other dimensions
can be customized according to project requirements.

Is FOSB packaging available for sapphire wafers?

Yes. FOSB packaging can be supplied according to wafer size,
quantity and customer packaging requirements.
Single wafer containers and wafer cassettes are also available.